Medverkande i utredning : Mattias Samuelsson På Wikipedia
( Tänk på att flera personer kan ha samma namn )

Samuelsson, Mattias, Handbok för ordning och reda på arbetsmarknaden, 2024, Landsorganisationen i Sverige och Bantorget grafiska AB, Stockholm och Stockholm

Magnuson, Martin, Tengdelius, Lina, Eriksson, Fredrik, Samuelsson, Mattias, Broitman, Esteban, Greczynski, Grzegorz, Hultman, Lars och Högberg, Hans, Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmosphere [Elektronisk resurs], Thin Solid Films, 2019, 688

Magnuson, Martin, Tengdelius, Lina, Greczynski, Grzegorz, Eriksson, Fredrik, Jensen, Jens, Lu, Jun, Samuelsson, Mattias, Eklund, Per, Hultman, Lars och Högberg, Hans, Compositional dependence of epitaxial Ti n+1 SiC n MAX-phase thin films grown from a Ti 3 SiC 2 compound target [Elektronisk resurs], Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2019, 37 nr 2

Nygren, Kristian, Samuelsson, Mattias, Flink, Axel, Ljungcrantz, Henrik, Kassman Rudolphi, Åsa och Jansson, Ulf, Growth and characterization of chromium carbide films deposited by high rate reactive magnetron sputtering for electrical contact applications [Elektronisk resurs], Surface & Coatings Technology, 2014, 260, 326–334

Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, Eriksson, Fredrik, Broitman, Esteban, Lu, Jun, Jensen, Jens och Hultman, Lars, Reactive sputtering of delta-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering [Elektronisk resurs], Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014, 32 nr 4, 041510

Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, Jensen, Jens och Hultman, Lars, beta-Ta and alpha-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas [Elektronisk resurs], Physica. B, Condensed matter, 2014, 439, 3–8

Tengdelius, Lina, Samuelsson, Mattias, Jensen, Jens, Lu, Jun, Hultman, Lars, Forsberg, Urban, Janzén, Erik och Högberg, Hans, Direct current magnetron sputtered ZrB 2 thin films on 4H-SiC(0001) and Si(100) [Elektronisk resurs], Thin Solid Films, 2014, 550, 285–290

Samuelsson, Mattias, Fundamental aspects of HiPIMS under industrial conditions, 2012, Department of Physics, Chemsitry and Biology (IFM), Linköping University och LiU-tr., Linköping och Linköping

Samuelsson, Mattias, Lundin, Daniel, Sarakinos, Kostas, Bjorefors, Fredrik, Walivaara, Bengt, Ljungcrantz, Henrik och Helmersson, Ulf, Influence of ionization degree on film properties when using high power impulse magnetron sputtering [Elektronisk resurs], Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30 nr 3, 031507

Samuelsson, Mattias, Sarakinos, Kostas, Högberg, Hans, Lewin, Erik, Jansson, Ulf, Wälivaara, Bengt, Ljungcrantz, Henrik och Helmersson, Ulf, Growth of TiC/a-C:H nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions [Elektronisk resurs], Surface & Coatings Technology, 2012, 206 nr 8–9, 2396–2402

Samuelsson, Mattias, Jensen, Jens, Helmersson, Ulf, Hultman, Lars och Högberg, Hans, ZrB 2 thin films grown by high power impulse magnetron sputtering (HiPIMS) from a compound target [Elektronisk resurs], Thin Solid Films, 2012, 526, 163–167

Samuelsson, Mattias, Fundamental aspects of HiPIMS under industrial conditions, 2012, Department of Physics, Chemsitry and Biology (IFM), Linköping University, Linköping

Samuelsson, Mattias, High power impulse magnetron sputtering under industrial conditions, 2011, Department of Physics, Chemistry and Biology, Linköpings universitet och LiU-tr., Linköping och Linköping

Samuelsson, Mattias, High power impulse magnetron sputtering under industrial conditions, 2011, Linköping University Electronic Press, Linköping

Samuelsson, Mattias, Lundin, Daniel, Jensen, Jens, Raadu, Michael A, Gudmundsson, Jon Tomas och Helmersson, Ulf, On the film density using high power impulse magnetron sputtering [Elektronisk resurs], Surface & Coatings Technology, 2010, 205 nr 2, 591–596

Samuelsson, Mattias och Skretting, Joakim, Mätning och analys av fuktkvoter i krypgrundskonstruktioner, 2005, Chalmers tekniska högskola, Göteborg

Samuelsson, Mattias, Effekter på resandet med regional expressbuss : finns det någon "expressbussfaktor"?, 2000, Lunds tekniska högskola, Lund

Samuelsson, Mattias, Fundamental Aspects of HiPIMS under Industrial Conditions [Elektronisk resurs], uuuu

Magnuson, Martin, Tengdelius, Lina, Greczynski, Grzegorz, Eriksson, Fredrik, Jensen, Jens, Lu, Jun, Samuelsson, Mattias, Eklund, Per, Hultman, Lars och Högberg, Hans, Compositional dependence of epitaxial Tin+1SiCn MAX-phase thin films grown from a Ti3SiC2 compound target, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2019, 37 nr 2, : American Institute of Physics (AIP)

Magnuson, Martin, Tengdelius, Lina, Eriksson, Fredrik, Samuelsson, Mattias, Broitman, Esteban, Greczynski, Grzegorz, Hultman, Lars och Högberg, Hans, Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmosphere, Thin Solid Films, 2019, 688, : Elsevier

Nygren, Kristian, Samuelsson, Mattias, Arwin, Hans och Jansson, Ulf, Optical methods to quantify amorphous carbon in carbide-based nanocomposite coatings, Thin Solid Films, 2017, 638, s. 291–297, : ELSEVIER SCIENCE SA

Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, Jensen, Jens och Hultman, Lars, beta-Ta and alpha-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmas, Physica. B, Condensed matter, 2014, 439, s. 3–8, : Elsevier

Högberg, Hans, Tengdelius, Lina, Samuelsson, Mattias, Eriksson, Fredrik, Broitman, Esteban, Lu, Jun, Jensen, Jens och Hultman, Lars, Reactive sputtering of delta-ZrH2 thin films by high power impulse magnetron sputtering and direct current magnetron sputtering, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2014, 32 nr 4, s. 041510-, : American Institute of Physics (AIP)

Nygren, Kristian, Samuelsson, Mattias, Flink, Axel, Ljungcrantz, Henrik, Kassman Rudolphi, Åsa och Jansson, Ulf, Growth and characterization of chromium carbide films deposited by high rate reactive magnetron sputtering for electrical contact applications, Surface & Coatings Technology, 2014, 260, s. 326–334, Elsevier : Elsevier BV

Tengdelius, Lina, Samuelsson, Mattias, Jensen, Jens, Lu, Jun, Hultman, Lars, Forsberg, Urban, Janzén, Erik och Högberg, Hans, Direct current magnetron sputtered ZrB2 thin films on 4H-SiC(0001) and Si(100), Thin Solid Films, 2014, 550, s. 285–290, : Elsevier BV

Samuelsson, Mattias, Fundamental aspects of HiPIMS under industrial conditions, 2012, Linköping University Electronic Press, Linköping

Samuelsson, Mattias, Sarakinos, Kostas, Högberg, Hans, Lewin, Erik, Jansson, Ulf, Wälivaara, Bengt, Ljungcrantz, Henrik och Helmersson, Ulf, Growth of Ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditions, Surface & Coatings Technology, 2012, 206 nr 8–9, s. 2396–2402, : Elsevier BV

Samuelsson, Mattias, Lundin, Daniel, Sarakinos, Kostas, Björefors, Fredrik, Walivaara, Bengt, Ljungcrantz, Henrik och Helmersson, Ulf, Influence of ionization degree on film properties when using high power impulse magnetron sputtering, Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films, 2012, 30 nr 3, s. 031507-, : American Vacuum Society

Samuelsson, Mattias, Jensen, Jens, Helmersson, Ulf, Hultman, Lars och Högberg, Hans, ZrB2 thin films grown by high power impulse magnetron sputtering (HiPIMS) from a compound target, Thin Solid Films, 2012, 526, s. 163–167, : Elsevier

Samuelsson, Mattias, High power impulse magnetron sputtering under industrial conditions, 2011, Linköping University Electronic Press, Linköping

Samuelsson, Mattias, Lundin, Daniel, Jensen, Jens, Raadu, Michael A., Gudmundsson, Jon Tomas och Helmersson, Ulf, On the film density using high power impulse magnetron sputtering, Surface & Coatings Technology, 2010, 205 nr 2, s. 591–596, : Elsevier BV

Samuelsson, Mattias, A Close Confinement Magnetron Design for use with HiPIMS, The 11:th International Conference on Plasma Surface Engineering,2008, 2008

Samuelsson, Mattias och Böhlmark, Johan, High Power Impulse Magnetron Sputtering; An Overwiev of History, Properties and Current Status, Nouvelles Tendances en Procedes Magnetron et Arc pour le Depot de Couches Minces New Trends in Magnetron and Arc Processing for Thin Film Deposition,2008 och 7th Iberian VCacuum Meeting 5th European Topical Conference on Hard Coatings,2008, 2008

Samuelsson, Mattias, High Power Impulse Magnetron Sputtering of Ti-Si-C Multifunctional Thin Films, AVS 55th International Symposium,2008, 2008

Popok, Vladimir, Prasalovich, Syargey, Samuelsson, Mattias och Campbell, Eleanor E.B., Design and capabilities of a cluster implantation and deposition apparatus: First results on hillock formation under energetic cluster ion bombardment, Review of Scientific Instruments, 2002, 73 nr 12, s. 4283–4287

Samuelsson, Mattias, Sarakinos, Kostas, Lewin, Erik, Greene, Joseph och Helmersson, Ulf, The effect of plasma-surface interactions on the structure formation of vapour deposited TiC/a-C:H nanocomposite films